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Halogen-bonded halogen(I) ion complexes

Year of publication

2023

Authors

Ward, Jas S.; Truong, Khai-Nghi; Erdélyi, Mate; Rissanen, Kari

Abstract

Halogen bonding occurs between a positive region of a polarized halogen (X), most commonly with an iodine or bromine atom. The polarization, caused by an electron withdrawing group (R), induces electron deficiency onto the halogen atom, creating an electropositive region known as a σ-hole. This σ-hole then interacts with electron-rich nucleophiles (such as Lewis bases, B) forming a linear R–X···B halogen bond. When an electron is completely removed from a halogen, a halogen (I) ion (X+) is formed. A halogen(I) ion itself is highly reactive, but can be ‘trapped’ in between two Lewis bases creating a [L–X–L]+ 3-center, 4-electron halogen bond between the halogen(I) ion and two donor atoms of the Lewis bases (typically nitrogen). Halogen(I) complexes form a special family manifesting a strong halogen bond, which demonstrate good stability in both the solution and solid-states. An overview of the current state of halogen bonding of halogen(I) ion complexes is included, as well as the many advancements made to those fields in recent years.
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Organizations and authors

University of Jyväskylä

Ward James Orcid -palvelun logo

Rissanen Kari Orcid -palvelun logo

Truong Khai-Nghi Orcid -palvelun logo

Publication type

Publication format

Article

Parent publication type

Compilation

Article type

Other article

Audience

Scientific

Peer-reviewed

Peer-Reviewed

MINEDU's publication type classification code

A3 Book section, Chapters in research books

Publication channel information

Publisher

Elsevier

Pages

586-601

​Publication forum

5318

​Publication forum level

2

Open access

Open access in the publisher’s service

No

Self-archived

No

Other information

Fields of science

Chemical sciences

Keywords

[object Object],[object Object],[object Object]

Publication country

Netherlands

Internationality of the publisher

International

Language

English

International co-publication

Yes

Co-publication with a company

No

DOI

10.1016/B978-0-12-823144-9.00043-1

The publication is included in the Ministry of Education and Culture’s Publication data collection

Yes