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Quasicubic alpha-Fe2O3 nanoparticles embedded in TiO2 thin films grown by atomic layer deposition

Peer-reviewed
DOI
10.1016/j.tsf.2016.06.036
Tamm, Aile; Seinberg, Liis; Kozlova, Jekaterina; Link, Joosep; Pikma, Piret; Stern, Raivo; Kukli, Ka...
Thin Solid Films2016

Holmium titanium oxide thin films grown by atomic layer deposition

Peer-reviewed
DOI
10.1016/j.tsf.2014.06.028
Kukli, Kaupo; Kemell, Marianna; Dimri, Mukesh Chandra; Puukilainen, Esa; Tamm, Aile; Stern, Raivo; R...
Thin Solid Films2014

Atomic layer deposition of MgO films on yttria-stabilized zirconia microtubes

Peer-reviewed
DOI
10.1016/j.tsf.2013.11.069
Part, Marko; Tamm, Aile; Kozlova, Jekaterina; Maendar, Hugo; Taette, Tanel; Kukli, Kaupo
Thin Solid Films2014

Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen

Peer-reviewed
DOI
10.1016/j.tsf.2011.11.088
Kukli, Kaupo; Aarik, Jaan; Aidla, Aleks; Jogi, Indrek; Arroval, Tonis; Lu, Jun; Sajavaara, Timo; Lai...
Thin solid films2012

Conduction and stability of holmium titanium oxide thin films grown by atomic layer deposition

Peer-reviewed
DOI
10.1016/j.tsf.2015.08.027
Castan, H.; Garcia, H.; Duenas, S.; Bailon, L.; Miranda, E.; Kukli, K.; Kemell, M.; Ritala, M.; Lesk...
Thin Solid Films2015

Bismuth iron oxide thin films using atomic layer deposition of alternating bismuth oxide and iron oxide layers

Peer-reviewed
DOI
10.1016/j.tsf.2016.05.006
Puttaswamy, Manjunath; Vehkamäki, Marko; Kukli, Kaupo; Dimri, Mukesh Chandra; Kemell, Marianna; Hata...
Thin Solid Films2016

Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)(3) and H2O

Peer-reviewed
DOI
10.1016/j.tsf.2014.06.052
Aarik, Lauri; Alles, Harry; Aidla, Aleks; Kahro, Tauno; Kukli, Kaupo; Niinisto, Jaakko; Mandar, Hugo...
Thin Solid Films2014

Studies on Li3AlF6 thin film deposition utilizing conversion reactions of thin films

Peer-reviewed
Open access
DOI
10.1016/j.tsf.2017.05.026
Mäntymäki, Miia Johanna; Mizohata, Kenichiro; Heikkilä, Mikko Juhani; Räisänen, Jyrki Antero; Ritala...
Thin Solid Films2017

Patterned films by atomic layer deposition using Parafilm as a mask

Peer-reviewed
Open access
DOI
10.1116/1.5001033
Zhang, Chao; Kalliomäki, Jesse; Leskelä, Markku; Ritala, Mikko
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films2018

Hydrogen-argon plasma pre-treatment for improving the anti-corrosion properties of thin Al2O3 films deposited using atomic layer deposition on steel

Peer-reviewed
DOI
10.1016/j.tsf.2013.03.022
Härkönen, Emma; Potts, Stephen E.; Kessels, Wilhelmus M. M.; Diaz, Belen; Seyeux, Antoine; Swiatowsk...
Thin Solid Films2013

Quasicubic alpha-Fe2O3 nanoparticles embedded in TiO2 thin films grown by atomic layer deposition

Peer-reviewed
DOI
10.1016/j.tsf.2016.06.036
2016

Holmium titanium oxide thin films grown by atomic layer deposition

Peer-reviewed
DOI
10.1016/j.tsf.2014.06.028
2014

Atomic layer deposition of MgO films on yttria-stabilized zirconia microtubes

Peer-reviewed
DOI
10.1016/j.tsf.2013.11.069
2014

Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen

Peer-reviewed
DOI
10.1016/j.tsf.2011.11.088
2012

Conduction and stability of holmium titanium oxide thin films grown by atomic layer deposition

Peer-reviewed
DOI
10.1016/j.tsf.2015.08.027
2015

Bismuth iron oxide thin films using atomic layer deposition of alternating bismuth oxide and iron oxide layers

Peer-reviewed
DOI
10.1016/j.tsf.2016.05.006
2016

Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)(3) and H2O

Peer-reviewed
DOI
10.1016/j.tsf.2014.06.052
2014

Studies on Li3AlF6 thin film deposition utilizing conversion reactions of thin films

Peer-reviewed
Open access
DOI
10.1016/j.tsf.2017.05.026
2017

Patterned films by atomic layer deposition using Parafilm as a mask

Peer-reviewed
Open access
DOI
10.1116/1.5001033
2018

Hydrogen-argon plasma pre-treatment for improving the anti-corrosion properties of thin Al2O3 films deposited using atomic layer deposition on steel

Peer-reviewed
DOI
10.1016/j.tsf.2013.03.022
2013